发明名称 PLASMA REACTION VESSEL AND GAS REFORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a gas reforming reactor by plasma capable of fitting to the reaction process of a reacting gas and consequently to drastically improve the gas reforming efficiency. SOLUTION: This plasma reaction vessel is provided with the first flat-plate electrode 3 and second flat-plate electrode 4 opposed to each other, a dielectric 5 interposed between the electrodes and a means 6 for imparting a potential difference between the electrodes 3 and 4, and a high voltage is impressed between the electrodes to decompose the gas introduced between the electrodes. Further, the ratio of the width W of the electrodes 3 and 4 practically orthogonal to the gas introducing direction to the length L in the gas introducing direction is set in accordance with the reforming reaction of the gas.
申请公布号 JP2001314754(A) 申请公布日期 2001.11.13
申请号 JP20000140300 申请日期 2000.05.12
申请人 HOKUSHIN IND INC;HONDA MOTOR CO LTD 发明人 MINOBE TAKESHI;FUJISHIRO HIDEYUKI;DOUSAKA KENJI;TORII MINORU;ANDO KAZUO;KOTANI KOJI
分类号 B01J19/08;C07B61/00;C07C2/80;(IPC1-7):B01J19/08 主分类号 B01J19/08
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