发明名称 |
PLASMA REACTION VESSEL AND GAS REFORMING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a gas reforming reactor by plasma capable of fitting to the reaction process of a reacting gas and consequently to drastically improve the gas reforming efficiency. SOLUTION: This plasma reaction vessel is provided with the first flat-plate electrode 3 and second flat-plate electrode 4 opposed to each other, a dielectric 5 interposed between the electrodes and a means 6 for imparting a potential difference between the electrodes 3 and 4, and a high voltage is impressed between the electrodes to decompose the gas introduced between the electrodes. Further, the ratio of the width W of the electrodes 3 and 4 practically orthogonal to the gas introducing direction to the length L in the gas introducing direction is set in accordance with the reforming reaction of the gas.
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申请公布号 |
JP2001314754(A) |
申请公布日期 |
2001.11.13 |
申请号 |
JP20000140300 |
申请日期 |
2000.05.12 |
申请人 |
HOKUSHIN IND INC;HONDA MOTOR CO LTD |
发明人 |
MINOBE TAKESHI;FUJISHIRO HIDEYUKI;DOUSAKA KENJI;TORII MINORU;ANDO KAZUO;KOTANI KOJI |
分类号 |
B01J19/08;C07B61/00;C07C2/80;(IPC1-7):B01J19/08 |
主分类号 |
B01J19/08 |
代理机构 |
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地址 |
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