发明名称 X-ray mask, and exposure method and apparatus using the same
摘要 An X-ray mask includes a mask pattern formed on a surface, a detachable protection cover attached on the surface for forming a dust-proof space for protecting the mask pattern, the protection cover being detached when the mask pattern is exposed with X-rays, and a hole for ventilating between the dust-proof space and an outer atmosphere.
申请公布号 US6317479(B1) 申请公布日期 2001.11.13
申请号 US19970857466 申请日期 1997.05.16
申请人 CANON KABUSHIKI KAISHA 发明人 CHIBA KEIKO;TSUKAMOTO MASAMI;WATANABE YUTAKA;HARA SHINICHI;MAEHARA HIROSHI
分类号 G03F1/14;G21K3/00;G21K5/00;H01L27/00;(IPC1-7):H01L27/00 主分类号 G03F1/14
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