发明名称 Ferroelectric memory device and method for manufacturing the same
摘要 A long life ferroelectric memory device using a thin ferroelectric film capacitor as a memory capacitor is obtained by disposing one or a plurality of degradation preventive layers on an upper protection electrode and an upper electrode 8 and a degradation preventive layer at the boundary of ferroelectric layer 7 /electrodes 6, 8, or providing a step of decreasing a modified layer at the boundary of ferroelectric layer 7/upper electrode 8. This provides a thin ferroelectric film capacitor which is subjected to less fatigue and imprinting and which has less degradation of the ferroelectric characteristic, thereby to attain a long life ferroelectric memory device.
申请公布号 US6316798(B1) 申请公布日期 2001.11.13
申请号 US19990331670 申请日期 1999.06.23
申请人 HITACHI, LTD. 发明人 OGATA KIYOSHI;HORIKOSHI KAZUHIKO;SUENAGA KAZUFUMI;KATO HISAYUKI;YOSHIZUMI KEIICHI;YAMAZAKI MASAHITO
分类号 H01L21/8247;H01L21/00;H01L21/02;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/10;H01L27/105;H01L27/108;H01L27/12;H01L29/76;H01L29/788;H01L29/792;H01L29/94;H01L31/062;H01L31/113;H01L31/119;(IPC1-7):H01L29/76 主分类号 H01L21/8247
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