发明名称 Semiconductor device with insulated gate transistor
摘要 An insulated gate transistor comprises source regions; drain regions; channel regions provided between the source and drain regions; a gate electrode; and gate insulative film provided between the channel regions and the gate electrode. The device has a semiconductor region which is provided so as to be in contact with the channel regions and has the same conductivity type as that of the channel region and has an impurity concentration higher than that of the channel region. The gate electrode has at least two opposite portions which face each other.
申请公布号 US6316813(B1) 申请公布日期 2001.11.13
申请号 US19950421931 申请日期 1995.04.14
申请人 CANON KABUSHIKI KAISHA 发明人 OHMI TADAHIRO;MIYAWAKI MAMORU
分类号 H01L29/78;H01L29/10;H01L29/423;(IPC1-7):H01L29/76 主分类号 H01L29/78
代理机构 代理人
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