发明名称 COATING/DRYING DEVICE, COATING/DRYING METHOD AND COATED MATERIAL MANUFACTURE THEREBY
摘要 PROBLEM TO BE SOLVED: To provide a coating/drying device for keeping the quality of the surface of a coating film excellent after drying while increasing the recovery efficiency of an applied solvent in case of manufacturing a photosensitive material or a display material using the solvent, the coating/drying method and a coated material having the quality of the surface of the coating film kept excellent. SOLUTION: A coating/drying device having at least a coating process and drying processes, has at least 2 drying processes existing under an inert gas atmosphere and each having a structure to recover the evaporated solvent, after the coating process. The drying process nearest to the coating process among the drying processes has a drying rate slower than that in the next drying process.
申请公布号 JP2001314798(A) 申请公布日期 2001.11.13
申请号 JP20000135726 申请日期 2000.05.09
申请人 KONICA CORP 发明人 TOBISAWA SEIICHI
分类号 G03C1/74;B05C9/14;B05D3/04;F26B13/02;(IPC1-7):B05C9/14 主分类号 G03C1/74
代理机构 代理人
主权项
地址