| 摘要 |
An exemplary embodiment of the invention is a semiconductor device comprising a substrate of a first conductivity type and a subcollector of a second conductivity type provided on the substrate. An intrinsic epitaxial layer is formed on the substrate. A collector region of the second conductivity type is adjacent the subcollector and a base region of the first conductivity type is adjacent the collector region. An emitter region of the second conductivity type is adjacent the base region and the emitter region has an emitter size. The subcollector and collector region both have a size not substantially greater than the emitter size. An alternate embodiment includes a spacer layer formed between the emitter region and the base region. |
