发明名称 |
STRUCTURE OF SUSCEPTOR FOR PREVENTING POLLUTION OF HEATER IN SEMICONDUCTOR MANUFACTURING EQUIPMENT |
摘要 |
PURPOSE: A structure of a susceptor for preventing pollution of a heater in semiconductor manufacturing equipment is provided to prevent flow of the gas for deposition and pollution of a heater by lengthening a lower portion of the susceptor(100). CONSTITUTION: A susceptor(100) is contacted closely with a guide ring(40) and a heater cup(70) in order to prevent flow of a deposition gas into an inside of a heater cup(70). The guide ring(40) and the heater cup(70) are located at a lower end portion of the susceptor(100). An argon gas is injected into the inside of the heater cup(70) in order to maintain a high pressure. A gap between the heater cup(70) and the guard ring(40) is covered fully by lengthening a lower portion of the susceptor(100). The depositon gas is not flown into the inside of the heater cup(70) since the lengthened lower portion of the susceptor(100) plays a role of a curtain function.
|
申请公布号 |
KR20010096048(A) |
申请公布日期 |
2001.11.07 |
申请号 |
KR20000019954 |
申请日期 |
2000.04.17 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, CHEOL HWAN |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|