发明名称 STRUCTURE OF SUSCEPTOR FOR PREVENTING POLLUTION OF HEATER IN SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PURPOSE: A structure of a susceptor for preventing pollution of a heater in semiconductor manufacturing equipment is provided to prevent flow of the gas for deposition and pollution of a heater by lengthening a lower portion of the susceptor(100). CONSTITUTION: A susceptor(100) is contacted closely with a guide ring(40) and a heater cup(70) in order to prevent flow of a deposition gas into an inside of a heater cup(70). The guide ring(40) and the heater cup(70) are located at a lower end portion of the susceptor(100). An argon gas is injected into the inside of the heater cup(70) in order to maintain a high pressure. A gap between the heater cup(70) and the guard ring(40) is covered fully by lengthening a lower portion of the susceptor(100). The depositon gas is not flown into the inside of the heater cup(70) since the lengthened lower portion of the susceptor(100) plays a role of a curtain function.
申请公布号 KR20010096048(A) 申请公布日期 2001.11.07
申请号 KR20000019954 申请日期 2000.04.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, CHEOL HWAN
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址