ELECTROSTATIC CHUCK HAVING DEPOSITION RING FOR PREVENTING CONTAMINATION OF PARTICLES

摘要

PURPOSE: An ESC(ElectroStatic Chuck) is provided to prevent contamination of a wafer and to improve a yield by forming a protrusion to a deposition ring. CONSTITUTION: The ESC(1) for clamping a semiconductor wafer(3) comprises a main body(7) for holding the wafer(3), a gas inlet(4) for applying argon gas to a rear surface of the wafer(3), and a deposition ring(6) coupled to edge portions of the main body(7). The deposition ring(6) further includes a protrusion(6') for collecting particles released from the rear surface of the wafer(3).