| 摘要 |
PURPOSE: A plasma deposition device for forming a thin film is provided to be capable of forming a uniform and high-quality film deposition on a large-sized deposition substrate and to increase the number of products (such as liquid crystal panel) to be taken from one deposition substrate, thereby contributing to the improvement of productivity. CONSTITUTION: A plasma deposition device(1) comprises electrodes(13) mounted on an electrode substrate(11), gas induction holes(12) provided between said electrodes(13) for introducing material gas G to the interior, a deposition substrate(30) provided to oppose to said electrodes(13) from a predetermined distance d, and a power source 60 generating plasma from said material gas by providing energy thereto, wherein material gas(G) is resolved to active species R deposited on said deposition substrate(30), characterized in applying voltage to adjacent electrodes(13) so as to generate discharge DC.
|
