发明名称 Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium
摘要 <p>There is provided an electron beam irradiation apparatus, an electron beam irradiation method, an original disc, a stamper, and a recording medium, capable of effectively avoiding scattering of an electron beam and avoiding provision of a large scale vacuum chamber. An electron beam irradiation apparatus includes a support section (4) for supporting an electron beam irradiation subject (3) to be irradiated with an electron beam (2), and an electron beam irradiation head (6) opposed to the electron beam irradiation subject via a minute space, the electron beam irradiation head (6) having an electron beam emission hole (5) for irradiating the electron beam irradiation subject (3) with the electron beam (2). In the electron beam irradiation head (6), an electron beam path (20) communicating with the electron beam emission hole (5) is provided, and in addition one or more ring shaped gas suction grooves (61) and (62) opened from a surface of the electron beam irradiation head facing the electron beam irradiation subject is formed around the electron beam emission hole (5). Vacuum pumps are coupled to the electron beam path (20) and the ring shaped gas suction grooves (61) and (62), and the electron beam path is held in a high vacuum state. &lt;IMAGE&gt;</p>
申请公布号 EP1152417(A2) 申请公布日期 2001.11.07
申请号 EP20010104999 申请日期 2001.03.01
申请人 SONY CORPORATION 发明人 AKI, YUICHI;KONDO, TAKAO;TAKEDA, MINORU;YAMAMOTO, MASANOBU;MASUHARA, SHIN;KASHIWAGI, TOSHIYUKI
分类号 G11B7/26;G21K5/04;G11B11/105;G11B23/00;G21K5/00;H01J37/09;H01J37/30;H01J37/301;H01J37/305;(IPC1-7):G11B23/00;H01J37/317;H01J37/18 主分类号 G11B7/26
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