| 摘要 |
PURPOSE: An electrode for plasma processing apparatus and a plasma processing apparatus are provided to improve capacity of the plasma processing apparatus by simplifying a structure of the electrode. CONSTITUTION: A lower electrode(1) has a main body(2). The main body(2) is formed by a planar member. A fluid is formed in a center portion of the main body(2). A fluid line(3) is formed in an inside of the main body(2). The fluid line(3) is formed by crossing a plurality of hole(4a,4b,4c) to a column direction and a row direction. A female screw portion is formed at an opening portion of the holes(4a,4b,4c) in order to close the holes(4a,4b,4c). The holes(4a,4b,4c) are closed by inserting a plug into the female screw portion. A thermal control operation is performed efficiently since a close portion is formed in an intermediate part of a fluid line(3) formed within the main body(2) of the lower electrode(1).
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