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发明名称
A method and apparatus for enhancing sidewall coverage during sputtering in a chamber having an inductively coupled plasma
摘要
申请公布号
EP0856593(B1)
申请公布日期
2001.11.07
申请号
EP19980101169
申请日期
1998.01.23
申请人
APPLIED MATERIALS, INC.
发明人
XU, ZHENG;YAO, GONGDA
分类号
C23C14/34;C23C14/04;C23C14/16;C23C14/35;H01J37/32;H01J37/34;H01L21/203;H01L21/285;H01L21/768;(IPC1-7):C23C14/22;C23C16/44
主分类号
C23C14/34
代理机构
代理人
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地址
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