| 发明名称 |
Silicon based substrate with yttrium silicate environmental/thermal barrier layer |
| 摘要 |
A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a yttrium silicate.
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| 申请公布号 |
US6312763(B1) |
申请公布日期 |
2001.11.06 |
| 申请号 |
US20000714396 |
申请日期 |
2000.11.16 |
| 申请人 |
UNITED TECHNOLOGIES CORPORATION;GENERAL ELECTRIC CO.;NASA |
发明人 |
EATON, JR. HARRY EDWIN;ALLEN WILLIAM PATRICK;JACOBSON NATHAN S.;LEE KANG N.;OPILA ELIZABETH J.;SMIALEK JAMES L.;WANG HONGYU;MESCHTER PETER JOEL;LUTHRA KRISHAN LAL |
| 分类号 |
B05D3/12;B05D7/00;B05D7/14;B05D7/24;B32B15/04;B32B18/00;B32B27/00;C04B41/50;C04B41/52;C04B41/85;C04B41/87;C04B41/89;C23C4/02;C23C4/06;C23C4/10;C23C4/18;C23C8/10;C23C30/00;(IPC1-7):C23C4/04 |
主分类号 |
B05D3/12 |
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