| 发明名称 |
Ester compounds, polymers, resist compositions and patterning process |
| 摘要 |
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
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| 申请公布号 |
US6312867(B1) |
申请公布日期 |
2001.11.06 |
| 申请号 |
US19990431139 |
申请日期 |
1999.11.01 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KINSHO TAKESHI;NISHI TSUNEHIRO;KURIHARA HIDESHI;HASEGAWA KOJI;WATANABE TAKERU;WATANABE OSAMU;NAKASHIMA MUTSUO;TAKEDA TAKANOBU;HATAKEYAMA JUN |
| 分类号 |
C07C57/00;C07C69/00;C07C69/013;C07C69/54;C08F20/18;G03F7/004;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
C07C57/00 |
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