发明名称 Thin film transistor and method for fabricating the same
摘要 Thin film transistor and method for fabricating the same, is disclosed, in which a channel width of the thin film transistor is made greater in a narrow area for improving an on/off performance of the thin film transistor, the thin film transistor including a source electrode formed on a substrate, a columnar conductive layer connected to the source electrode, a drain electrode formed on the conductive layer, a gate insulating film formed to cover the conductive layer and the drain electrode, a gate electrode formed on the gate insulating film surrounding the conductive layer, and an insulting film formed between the source electrode and the gate electrode.
申请公布号 US6312992(B1) 申请公布日期 2001.11.06
申请号 US19980158793 申请日期 1998.09.23
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. 发明人 CHO SEOK WON
分类号 H01L21/336;H01L21/8244;H01L29/786;(IPC1-7):H01L21/336;H01L27/108 主分类号 H01L21/336
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