发明名称 Surface inspection apparatus and method
摘要 A surface inspection apparatus is provided which uses at least two sets of surface inspection systems each comprising with a paired surface illumination device (A1, B1) and detection device (A2, B2), with each set of illumination devices and detection devices creating their own irradiation regions (51A, 51B) and detection regions (23A,23B), in which the irradiation and detection regions of one pair of illumination and detection devices does not over lap the illumination and detection regions of the adjacent pair of illumination and detection devices. The surface illumination devices preferably project light at an angle of 80° or more with respect to a normal to the surface being inspected (21). The detection devices detect light scattered by dust or defects on the surface to be inspected. The surface to be inspected can be moved in a direction perpendicular to the direction of the illumination and detection regions on the surface being inspected. Thus, the entire surface can be inspected. The inspection device and method can also be adapted for use in a liquid crystal display manufacturing operation.
申请公布号 US6313913(B1) 申请公布日期 2001.11.06
申请号 US19990447691 申请日期 1999.11.23
申请人 NIKON CORPORATION 发明人 NAKAGAWA YUMI;KOMATSU KOICHIRO
分类号 G01N21/88;G01N21/94;G01N21/956;(IPC1-7):G01N21/00 主分类号 G01N21/88
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