发明名称 |
Mask orbiting for laser ablated feature formation |
摘要 |
A Method and Apparatus for ablating features from a substrate, such as drilling holes in a polymer substrate for an ink jet printhead, by illuminating the substrate that has passed through a mask that is continuously orbited or moved in a two dimensional pattern. The mask is capable of following a trajectory perpendicular to the angle of the radiation. |
申请公布号 |
US6313435(B1) |
申请公布日期 |
2001.11.06 |
申请号 |
US19980196962 |
申请日期 |
1998.11.20 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
SHOEMAKER CURTIS L.;AGUIRRE LUIS A. |
分类号 |
B41J2/135;B23K26/00;B23K26/06;B23K26/38;B23K101/36;B41J2/14;B41J2/16;(IPC1-7):B23K26/38 |
主分类号 |
B41J2/135 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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