发明名称 Mask orbiting for laser ablated feature formation
摘要 A Method and Apparatus for ablating features from a substrate, such as drilling holes in a polymer substrate for an ink jet printhead, by illuminating the substrate that has passed through a mask that is continuously orbited or moved in a two dimensional pattern. The mask is capable of following a trajectory perpendicular to the angle of the radiation.
申请公布号 US6313435(B1) 申请公布日期 2001.11.06
申请号 US19980196962 申请日期 1998.11.20
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 SHOEMAKER CURTIS L.;AGUIRRE LUIS A.
分类号 B41J2/135;B23K26/00;B23K26/06;B23K26/38;B23K101/36;B41J2/14;B41J2/16;(IPC1-7):B23K26/38 主分类号 B41J2/135
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