发明名称 Semiconductor device of high-voltage CMOS structure and method of fabricating same
摘要 A transistor of a second conductivity type is of an LMOS structure, and a transistor of a first conductivity type is of an LDMOS structure. The transistor of the first conductivity type has a drain base layer which functions in the same manner as a drain offset diffusion layer and is formed in a substrate separately from a source base diffusion layer. The transistor of the first conductivity type has a stably high breakdown voltage and a low on-state resistance as with the transistor of the second conductivity type.
申请公布号 US6313508(B1) 申请公布日期 2001.11.06
申请号 US19980179851 申请日期 1998.10.28
申请人 NEC CORPORATION 发明人 KOBAYASHI KENYA
分类号 H01L29/786;H01L21/336;H01L21/77;H01L21/8238;H01L21/84;H01L27/092;H01L27/12;(IPC1-7):H01L27/01 主分类号 H01L29/786
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