发明名称 |
MONITORING OF EFFLUENT FROM CHAMBER AND CHAMBER CLEANING APPARATUS |
摘要 |
PURPOSE: A monitoring of effluent from chamber is provided to stop processing after a predetermined period or to determine a process endpoint, such as an endpoint of a chamber cleaning process, and to clean chamber walls and surfaces without erosion of chamber surfaces. CONSTITUTION: An energizing cell(22) is adapted to receive an effluent. A gas energizer(17) is able to energize the effluent in the cell(22) to emit a radiation. A radiation permeable window(27) is spaced apart from an interior wall 36 of the(22) cell by a distance d that is sufficiently high to reduce a deposition of effluent residue from the energized gas on the window(27), A detector(26) detects the radiation. |
申请公布号 |
KR20010095208(A) |
申请公布日期 |
2001.11.03 |
申请号 |
KR20010017140 |
申请日期 |
2001.03.31 |
申请人 |
APPLIED MATERIALS INC. |
发明人 |
BACH TUNG;PHAM QUYEN;TSAI KENNETH |
分类号 |
B01J19/08;C23C14/00;C23C16/44;H01J37/32;H01L21/02;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01L21/02 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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