| 摘要 |
PURPOSE: Provided is a chemically amplified positive resist composition excellent in the balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion, and the like. CONSTITUTION: The chemically amplified positive resist composition comprises a resin which has the following polymeric units(A), (B) and (C), and an acid generating agent. (A): at least one polymeric unit of an alicyclic lactone selected from polymeric units represented by the following formulas(1a) and (1b). (B): at least one polymeric unit selected from a polymeric unit of 3-hydroxy-1-adamantyl(meth)acrylate represented by the following formula 2, a polymeric unit of a combination of a unit represented by the following formula 3 and a unit derived from unsaturated dicarboxylic acid anhydrides selected from maleic anhydride and itaconic anhydride and a polymeric unit of (alpha) beta-(meta)acryloyloxy-gamma-butyrolactone represented by the following formula(4). (C): A polymeric unit which becomes alkali-soluble by cleavage of a part of groups by the action of an acid. In the formulas, R1, R2, R3 and R7 are each independently hydrogen or methyl, n is 1-3, R4 is hydrogen or hydroxyl group, R5 and R6 are each independently hydrogen, alkyl of C1-C3, hydroxyalkyl of C1-C3, carboxyl group, cyano or a group of formula -COOP7(wherein, P7 is an alkyl residue), R5 and R6 form a carboxylic acid anhydride residue of formula -C(=O)OC(=O)-.
|
