MICROLITHOGRAPHY ILLUMINATING METHOD AND DEVICE, AND MICROLITHOGRAPHY PROJECTION EXPOSURE DEVICE AND METHOD USING THE SAME

摘要

PURPOSE: Provided are an illuminating device which can supply projection objectives having an off-axis field with minimum lens diameters, illuminating method, a microlithography projection exposure device equipped with the illuminating device, and a microlithography projection exposure method. CONSTITUTION: The microlithographic illuminating device defines an optical axis(OAI) and includes a light source for supplying and transmitting a light beam along the optical axis(OAI); a plurality of optical elements arranged along the optical axis downstream of the light source for conducting the light beam on a beam path along the optical axis and for defining a field; and, one of the optical elements(AE) being arranged close to the field for intercepting all of the light beam and being configured so as to be asymmetrical with respect to the optical axis. The microlithographic projection exposure device comprises the illuminating device; a reticle positioning and moving system(Oret); a projection objective(P) downstream of the illuminating system and defining a second optical axis(OAP); an object field(OF) dispersed with respect to the second optical axis(OAP); and a wafer positioning and moving system(OW).