| 摘要 |
PROBLEM TO BE SOLVED: To provide a photopolymerizable composition excellent in work efficiency, profitableness and shelf stability and used as a material of an original plate for a planographic printing plate for scanning exposure fit for a CTP system or a planographic printing plate having high sensitivity to the oscillation wavelength of a low-cost short-wavelength semiconductor laser. SOLUTION: The photopolymerizable composition is not sensitive to light of >=500 nm, accords with a short-wavelength laser having the wavelength of light for exposure in the range of 350-450 nm and contains one electron transferring initiation system selected from (i) a system comprising an electron donative initiator and a sensitizing dye, (ii) a system comprising an electron accepting initiator and a sensitizing dye and (iii) a system comprising an electron donative initiator, a sensitizing dye and an electron accepting initiator (a ternary initiation system). |
