发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in removability, developability, scumming resistance, adhesion and work efficiency, a photosensitive element, a method for producing a resist pattern using the element and a method for producing a printed wiring board using the element. SOLUTION: The photosensitive resin composition contains (A) two or more binder polymers, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated bond in one molecule and (C) a photopolymerization initiator. The component (B) contains (b1) a compound having one polymerizable ethylenically unsaturated bond and at least one phenyl or phenylene group in one molecule as an essential component. The photosensitive element is obtained by applying, drying and laminating the photosensitive resin composition on a substrate.
申请公布号 JP2001305730(A) 申请公布日期 2001.11.02
申请号 JP20000128989 申请日期 2000.04.25
申请人 HITACHI CHEM CO LTD 发明人 OHASHI TAKESHI
分类号 G03F7/027;C08F2/44;C08F2/50;C08F291/00;G03F7/031;G03F7/033;H05K3/06;H05K3/18 主分类号 G03F7/027
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