发明名称 |
PHOTOSENSITIVE COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition useful to form a soldering resist film and the insulating resin layers of various electronic parts. SOLUTION: The photosensitive composition consists essentially of (A) a prepolymer having both a polymerizable unsaturated group and a carboxyl group in one molecule, (B) a photopolymerization initiator, (C) a reactive diluent copolymerizable with the prepolymer (A), (D) a blocked isocyanate compound having two or more blocked isocyanato groups in one molecule and (E) an adhesion imparting agent. |
申请公布号 |
JP2001305726(A) |
申请公布日期 |
2001.11.02 |
申请号 |
JP20010030391 |
申请日期 |
2001.02.07 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
KUSAKA HIROSHI;HATA KAZUYUKI;SOEJIMA YUJI |
分类号 |
G03F7/004;C08G18/80;C08G59/14;G03F7/027;G03F7/085;H05K3/28 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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