发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition useful to form a soldering resist film and the insulating resin layers of various electronic parts. SOLUTION: The photosensitive composition consists essentially of (A) a prepolymer having both a polymerizable unsaturated group and a carboxyl group in one molecule, (B) a photopolymerization initiator, (C) a reactive diluent copolymerizable with the prepolymer (A), (D) a blocked isocyanate compound having two or more blocked isocyanato groups in one molecule and (E) an adhesion imparting agent.
申请公布号 JP2001305726(A) 申请公布日期 2001.11.02
申请号 JP20010030391 申请日期 2001.02.07
申请人 MITSUBISHI CHEMICALS CORP 发明人 KUSAKA HIROSHI;HATA KAZUYUKI;SOEJIMA YUJI
分类号 G03F7/004;C08G18/80;C08G59/14;G03F7/027;G03F7/085;H05K3/28 主分类号 G03F7/004
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