| 摘要 |
PROBLEM TO BE SOLVED: In a case where plural kinds of deflection yokes with different properties of deflection quantity for an electron beam are employed in an identical kind of a color cathode-ray tube, especially, in the case where a rotary erroneous landing pattern is generated, to provide an exposing method to the cathode- ray tube and an exposure device of the cathode-ray tube capable of focusing a locus of a exposed light on a locus of an electron beam when exposed without using a new lens for correction. SOLUTION: A shade structure 16 that has a slit 16a and movable to Y direction of a panel's rectangle side, when exposed, is attached to an exposing device. A rotary erroneous landing quantity D1 of the electron beam is preliminarily calculated in a whole plane for each kind of deflection yoke. Then, a position of a light source for exposure is moved to an X direction in accordance with the position of the slit 16a in order to make a landing position of the light for exposure 17a to correct the rotary erroneous landing D1.
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