| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for determining the etching rates of cleaning liquid and whether the ratio between the etching rates is within a desired range. SOLUTION: There are a method of determining the etch rates of cleaning liquid and whether the ratio between the etching rates is within a specified range, by estimating the etching rates to a doped oxide film and a nondoped oxide film from the electrical conductivity of the cleaning liquid, and estimating the ratio of the etching rate to the above doped oxide film to the etching rate to the nondoped oxide film from the water concentration of the cleaning liquid, as a method of determining the etch rates of the cleaning liquid including an ammonium monohydrodifluoride, water, and isopropyl alcohol(IPA) to the doped oxide film of BPSG or BSG and the nondoped oxide film being TEOS or THOX and whether the ratio of the etch rate to the doped oxide film to the etching rate to the nondoped oxide film is within a specified range, and a cleaner utilizing that determination method.
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