发明名称 INSULATED GATE SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce ON voltage and restrain the operation of a parasitic thyristor or the like. SOLUTION: In a body region 30 of an insulated gate semiconductor device 20 which is constituted as a trench IGBT and in the body region 30 in a bonded part to an emitter region 32, a high concentration region 34 is formed by using P-type semiconductor whose impurity concentration is higher than that of the body region 30, so as not to be in contact with trench gates 28. The high concentration region 34 makes carriers stored in an element flow to the emitter region 32 in the case of turn-OFF, so that the ON-operation of a parasitic thyristor can be prevented. The body region 30 is formed of P-type semiconductor whose impurity concentration is low, so that a channel can be formed even if a voltage applied to the trench gates 28 is low. As a result, the ON-state voltage can be reduced.
申请公布号 JP2001308328(A) 申请公布日期 2001.11.02
申请号 JP20000122898 申请日期 2000.04.24
申请人 TOYOTA CENTRAL RES & DEV LAB INC;TOYOTA MOTOR CORP 发明人 KAWAJI SACHIKO;MURATA TOSHIO;ISHIKO MASAYASU;HAMADA KIMIMORI
分类号 H01L29/78;H01L29/739;(IPC1-7):H01L29/78 主分类号 H01L29/78
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