| 摘要 |
PROBLEM TO BE SOLVED: To provide electrodes for a charged particle beam apparatus, specifically an electron beam apparatus, using a material for electrodes which has extremely high strength and excellent processability, and develops high durability to oxygen plasma irradiation, and which makes it possible to sufficiently inhibit variation of a resistance values; and to make it possible to accurately perform electromagnetic deflection and to precisely and quickly shift spot positions. SOLUTION: A sub-deflector 11 is used for controlling positions of electron beam spots in a main deflecting area within a unit of 100 μm of an EB exposure apparatus. The sub-deflector 11 is composed of the material for electrodes containing a non-magnetic oxide ceramics, an oxide crystallized glass, and an oxide glass. |
