| 摘要 |
PURPOSE: A method for fabricating a field emission display device is provided to simplify a fabrication process and reduce a fabrication cost by forming a structure for lengthening a lifetime of a cathode without performing a gate aperture fabrication process. CONSTITUTION: A cathode electrode(12) is formed on a substrate(11). An insulating layer(13) having an aperture is formed on the cathode electrode(12). The insulating layer(13) is etched by using photoresist(21). The photoresist(21) is removed and an isolation layer(22) is formed on the insulating layer(13). In the process for forming the isolation layer, the substrate(11) is rotated and an incline deposition process is performed by using an electron beam deposition device. A diamond cathode(20) and a diamond layer(23) are formed within the aperture of the insulating layer(13) by using diamond. The isolation layer(22) is removed by performing a liftoff process.
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