发明名称 |
EXPOSURE DEVICE AND EXPOSURE METHOD |
摘要 |
PROBLEM TO BE SOLVED: To expose only the desired regions of a photosensitive substrate without increasing the width of light shielding zones disposed at a mask. SOLUTION: This exposure device has blinds 4a and 4b movable in a direction approximately along the moving direction of the mask so as to shield the optical path of illumination light EL emitted from an illumination optical system between the mask (55) and a projection optical system 5. The blinds 41a and 41b are so moved as to cover the segments (light shielding zones) exclusive of the pattern regions 55 of the mask during the synchronous movement of the mask and the photosensitive substrate (56). |
申请公布号 |
JP2001305747(A) |
申请公布日期 |
2001.11.02 |
申请号 |
JP20010039450 |
申请日期 |
2001.02.16 |
申请人 |
NIKON CORP |
发明人 |
GOTO EIJI;WATANABE SATOYUKI;MIYAZAKI MUTSUMI |
分类号 |
G02B5/00;G02B19/00;G03F7/20;G03F7/22;H01L21/027;(IPC1-7):G03F7/22 |
主分类号 |
G02B5/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|