发明名称 EXPOSURE DEVICE AND METHOD FOR MANUFACTURING MICRODEVICE
摘要 PROBLEM TO BE SOLVED: To provide an exposure device, etc., which is capable of correcting the inclination component of an illuminance distribution at a surface to be irradiated. SOLUTION: This exposure device has a light guide member which transmits illumination light, an illumination unit which introduces the illumination light from this light guide member to a mask and forms a prescribed illumination region on the mask, a projection unit which projects the pattern image of the mask to a photosensitive substrate and an inclining means which inclines the exit end of the light guide member with respect to the optical axis of the illumination unit.
申请公布号 JP2001305743(A) 申请公布日期 2001.11.02
申请号 JP20000118445 申请日期 2000.04.19
申请人 NIKON CORP 发明人 SHIBA HIROYASU;KOYAMA MOTOO
分类号 G03F7/20;H01L21/027;(IPC1-7):G03F7/20 主分类号 G03F7/20
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