摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device, etc., which is capable of correcting the inclination component of an illuminance distribution at a surface to be irradiated. SOLUTION: This exposure device has a light guide member which transmits illumination light, an illumination unit which introduces the illumination light from this light guide member to a mask and forms a prescribed illumination region on the mask, a projection unit which projects the pattern image of the mask to a photosensitive substrate and an inclining means which inclines the exit end of the light guide member with respect to the optical axis of the illumination unit. |