发明名称 METHOD FOR FORMING MAGNETIC LAYER PATTERN AND METHOD FOR MANUFACTURING THIN FILM MAGNETIC HEAD
摘要 PROBLEM TO BE SOLVED: To provide methods for forming a magnetic layer pattern and manufacturing a thin film magnetic head in which the number of manufacturing stages and manufacturing time are reduced. SOLUTION: A precursory non-magnetic layer and a precursory lower magnetic pole layer are formed in this order so as to cover a frame pattern 50 formed on a base layer (an upper shielding layer 7) and having an opening part 50u. Subsequently, a non-magnetic layer 8 and a lower magnetic pole 9 are selectively formed by polishing the entire body by a CMP method until at least the frame pattern 50 is exposed and patterning the precursory non- magnetic layer and the precursory lower magnetic pole layer. Thus, the number of the manufacturing stages and the manufacturing time can be reduced compared with the case in which the non-magnetic layer 8 and the lower magnetic pole 9 are formed without forming the frame pattern 50.
申请公布号 JP2001307306(A) 申请公布日期 2001.11.02
申请号 JP20000121300 申请日期 2000.04.21
申请人 TDK CORP 发明人 SASAKI YOSHITAKA
分类号 G11B5/31;H01F41/34;(IPC1-7):G11B5/31 主分类号 G11B5/31
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