发明名称 |
Lithographic plate materials and method for making lithographic plates using the same |
摘要 |
There is provided a lithographic plate material which can be desensitized by distilled water or a fountain solution used for other lithographic plates without desensitizing process using an etching solution and lowers generation of scumming in non-image portion of printed matters. The lithographic plate material has an image-receptive layer formed on a support consisting of at least polyvinyl alcohol cross-linked by tetra alkoxy silane hydrolysate, titanium oxide micropatricles, silica having an average particle size of not less than 1 nm and less than 100 nm. The image-receptive layer has a surface having an arithmetic mean roughness of not less than 0.40 mum and less than 1.20 mum and a contact angle of less than 50 degree to distilled water at room temperature, and is ink-receptive for hot-melt and lipophilic ink.
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申请公布号 |
US2001035105(A1) |
申请公布日期 |
2001.11.01 |
申请号 |
US20010814112 |
申请日期 |
2001.03.22 |
申请人 |
KIMOTO CO., LTD. |
发明人 |
KATSUOKA TOSHIMICHI;NOUDA JUNICHI;SATO HIRONORI |
分类号 |
B41C1/10;B41N1/14;C08K3/00;C08K3/22;C08K3/36;C08L29/04;C08L101/12;C09D5/00;C09D129/04;C09D183/02;(IPC1-7):B41N1/00;B41N3/00 |
主分类号 |
B41C1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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