| 发明名称 |
DETERGENT COMPOSITION |
| 摘要 |
A detergent composition characterized by comprising (1) at least one of fluoride salts and hydrogen fluoride salts, (2) an organic solvent having a heteroatom, and (3) water; a method of cleansing a metal gate, contact hole, via hole, and capacitor with the composition; a method of removing a residual polymer derived from a resist; and a method of cleansing after CMP.
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| 申请公布号 |
WO0181525(A1) |
申请公布日期 |
2001.11.01 |
| 申请号 |
WO2001JP03620 |
申请日期 |
2001.04.26 |
| 申请人 |
DAIKIN INDUSTRIES, LTD.;KEZUKA, TAKEHIKO;ITANO, MITSUSHI |
发明人 |
KEZUKA, TAKEHIKO;ITANO, MITSUSHI |
| 分类号 |
C11D3/02;C11D3/43;C11D7/10;C11D7/50;C11D11/00;G03F7/42;H01L21/306;(IPC1-7):C11D7/10;H01L21/304;H01L21/308 |
主分类号 |
C11D3/02 |
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