发明名称 WAFER STAGE WITH MAGNETIC BEARINGS
摘要 A high accuracy stage (1) supported in six degrees of freedom by electromagnetic bearings. Movements in the horizontal plane of the stage are supported by variable reluctance actuators which are mounted between the high accuracy stage (1) and a coarse stage (18) so as not to distort the high accuracy stage (1) during movements thereof. The high accuracy stage is supported in three vertical degrees of freedom by electromagnetic actuator devices which are preferably voice coil motors (12, 14) extending between the coarse stage (18) and the high accuracy stage (1). Additionally, dead weight supports are provided between the coarse stage (18) and the high accuracy stage (1) for vertically supporting the dead weight of the high accuracy stage (1). The dead weight supports are preferably air bellows (20).
申请公布号 WO0181171(A1) 申请公布日期 2001.11.01
申请号 WO2000US10831 申请日期 2000.04.21
申请人 NIKON CORPORATION;HAZELTON, ANDREW, J.;EBIHARA, AKIMITSU;NOVAK, W., THOMAS 发明人 HAZELTON, ANDREW, J.;EBIHARA, AKIMITSU;NOVAK, W., THOMAS
分类号 G03F7/20;(IPC1-7):B64C17/06 主分类号 G03F7/20
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