发明名称 Composition for eliminating thermosetting resin
摘要 A composition suitable for eliminating a thermosetting resin (and a method of so using the composition) is disclosed. In the composition, tetra methyl ammonium hydroxide (TMAH) is included so as to eliminate the thermosetting resin. Accordingly, the composition is suitable for removing a dielectric layer, an organic protective layer, an insulating layer, an alignment layer, black matrices and color filters, etc. made form a thermosetting resin in an LCD or a semiconductor, and permits a reproduction or a rework of the thermosetting resin film.
申请公布号 US2001035519(A1) 申请公布日期 2001.11.01
申请号 US20010765672 申请日期 2001.01.22
申请人 RYU KI HYUN 发明人 RYU KI HYUN
分类号 C09K3/00;H01L21/00;(IPC1-7):H01L21/00 主分类号 C09K3/00
代理机构 代理人
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