发明名称 |
Forming a transparent window in a polishing pad for a chemical mehcanical polishing apparatus |
摘要 |
The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.
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申请公布号 |
US2001036805(A1) |
申请公布日期 |
2001.11.01 |
申请号 |
US20010863118 |
申请日期 |
2001.05.22 |
申请人 |
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发明人 |
BIRANG MANOOCHER M.B.;GLEASON ALLAN;GUTHRIE WILLIAM L. |
分类号 |
B24B37/04;B24B47/12;B24B49/02;B24B49/04;B24B49/12;B24B51/00;B24D7/12;B24D13/14;G01B11/06;H01L21/304;(IPC1-7):B23F21/23;B24D11/00 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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