发明名称 |
METHOD AND SYSTEM FOR THICK-FILM DEPOSITION OF CERAMIC MATERIALS |
摘要 |
<p>A method of depositing a solid film on a substrate (28) in which a stream comprising particles suspended in a transport gas is moved through a heating zone (30). The particles are combined with the transport gas from a powder feeder (22) operatively coupled to a gas flow tube (16). The particle stream is directed toward the heating zone (30) by ejecting the powder stream from a nozzle connected to a distal end of the gas flow tube. A radiation source (34) is directed at the suspended particles as they move through the heating zone (30) so that the particles are heated to a molten state. The molten droplets are undercooled in a cooling zone (32) before impact with the substrate (28).</p> |
申请公布号 |
WO0181648(A1) |
申请公布日期 |
2001.11.01 |
申请号 |
WO2001US12952 |
申请日期 |
2001.04.20 |
申请人 |
VANDERBILT UNIVERSITY;HOFMEISTER, WILLIAM |
发明人 |
HOFMEISTER, WILLIAM |
分类号 |
C04B35/45;C23C4/12;C23C24/04;(IPC1-7):C23C4/00 |
主分类号 |
C04B35/45 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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