发明名称 METHOD AND SYSTEM FOR THICK-FILM DEPOSITION OF CERAMIC MATERIALS
摘要 <p>A method of depositing a solid film on a substrate (28) in which a stream comprising particles suspended in a transport gas is moved through a heating zone (30). The particles are combined with the transport gas from a powder feeder (22) operatively coupled to a gas flow tube (16). The particle stream is directed toward the heating zone (30) by ejecting the powder stream from a nozzle connected to a distal end of the gas flow tube. A radiation source (34) is directed at the suspended particles as they move through the heating zone (30) so that the particles are heated to a molten state. The molten droplets are undercooled in a cooling zone (32) before impact with the substrate (28).</p>
申请公布号 WO0181648(A1) 申请公布日期 2001.11.01
申请号 WO2001US12952 申请日期 2001.04.20
申请人 VANDERBILT UNIVERSITY;HOFMEISTER, WILLIAM 发明人 HOFMEISTER, WILLIAM
分类号 C04B35/45;C23C4/12;C23C24/04;(IPC1-7):C23C4/00 主分类号 C04B35/45
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