发明名称 |
Coater having controllable pressurized process chamber for semiconductor processing |
摘要 |
A coater having a controllable pressurized process chamber for applying photoresist to a wafer is provided. The controllable pressurized process chamber reduces the evaporation of solvent in the photoresist during a spin-on process step. Reducing premature curing of the photoresist results in improved uniform planarization of the photoresist layer. Contaminants in the photoresist are also reduced by having an environmentally controllable process chamber. A housing having a upper and lower section forms a process chamber surrounding a wafer chuck. The upper housing section includes a solvent vapor opening for introducing pressurized solvent vapor into the process chamber and the lower housing section includes an exhaust opening. The upper housing section also includes an opening for introducing photoresist onto a wafer. A control device is coupled to the exhaust opening and a vacuum device for controlling the pressure in the process chamber. A sealed recycling photoresist container and recycling apparatus is also coupled to the exhaust opening to store unused photoresist. The unused photoresist may be used in subsequent spin-on process steps, thereby reducing processing costs.
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申请公布号 |
US2001035125(A1) |
申请公布日期 |
2001.11.01 |
申请号 |
US20010885230 |
申请日期 |
2001.06.19 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
TALIEH HOMAYOUN;LURYE ALEX |
分类号 |
B05C11/08;G03F7/16;H01L21/027;(IPC1-7):B05C11/00 |
主分类号 |
B05C11/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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