发明名称 |
Overlay measuring pattern, photomask, and overlay measuring method and apparatus |
摘要 |
An overlay measuring pattern has a rectangular portion and band-shaped portions separated from opposite sides of the rectangular portion by an equal distance and parallel to the sides. Even when a photoresist shrinks upon heating after the overlay measuring pattern is transferred to the photoresist, the taper amounts of the sides of the rectangular portion transferred to the photoresist equal each other in their sections between opposite sides. Hence, the overlay shift can be accurately obtained.
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申请公布号 |
US2001036582(A1) |
申请公布日期 |
2001.11.01 |
申请号 |
US20010866742 |
申请日期 |
2001.05.30 |
申请人 |
KITAGAWA TETSUYA |
发明人 |
KITAGAWA TETSUYA |
分类号 |
H01L21/027;G01B11/24;G03F1/08;G03F7/20;G03F9/00;(IPC1-7):G03F9/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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