发明名称 Plasma processing apparatus
摘要 An electromagnetic wave absorber (4) of a material that causes a large dielectric or magnetic loss is disposed so as to surround a region between a high-frequency wave transmitting window (3) and an antenna (32) to suppress the formation of a sanding wave by suppressing the reflection of microwaves.
申请公布号 US2001036465(A1) 申请公布日期 2001.11.01
申请号 US20000726050 申请日期 2000.11.30
申请人 ISHLL NOBUO;YASAKA YASUYOSHI 发明人 ISHLL NOBUO;YASAKA YASUYOSHI
分类号 H05H1/30;H01J37/32;(IPC1-7):A61K9/00 主分类号 H05H1/30
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