发明名称 |
Plasma processing apparatus |
摘要 |
An electromagnetic wave absorber (4) of a material that causes a large dielectric or magnetic loss is disposed so as to surround a region between a high-frequency wave transmitting window (3) and an antenna (32) to suppress the formation of a sanding wave by suppressing the reflection of microwaves.
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申请公布号 |
US2001036465(A1) |
申请公布日期 |
2001.11.01 |
申请号 |
US20000726050 |
申请日期 |
2000.11.30 |
申请人 |
ISHLL NOBUO;YASAKA YASUYOSHI |
发明人 |
ISHLL NOBUO;YASAKA YASUYOSHI |
分类号 |
H05H1/30;H01J37/32;(IPC1-7):A61K9/00 |
主分类号 |
H05H1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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