METHOD FOR INSPECTING DEFECTS OF RETICLE

摘要

PURPOSE: A defect inspection method is provided to easily inspect defects of a chrome pattern formed on a reticle. CONSTITUTION: A chrome pattern is formed on a reticle(31). A simulation for detecting defects is performed against of patterns formed on a wafer by varying exposure conditions using a batch file(32). The limit of defects is classified by each layer using data achieved by the simulation(33). Then, reticle defects are inspected by using the classified data(34). The exposure conditions for the simulation are a numerical aperture, an optical source, and a size of the aperture.