发明名称 METHOD FOR MANUFACTURING ITO TARGET
摘要 PROBLEM TO BE SOLVED: To reduce the number of pores by improving dispersibility of tin and to efficiently manufacture a target of ITO sintered compact reduced in the occurrence of nodules and suitably used for deposition of ITO thin film and, hereby, to suppress deterioration in film quality and reduction in the productivity of film. SOLUTION: The ITO target can be manufactured by mixing a disperse solution in which metastannic acid is dispersed with a disperse solution in which indium hydroxide is dispersed to form a mixed disperse solution, drying and calcining this mixed disperse solution, and subjecting a green compact of the resultant oxide powder mixture to sintering.
申请公布号 JP2001303239(A) 申请公布日期 2001.10.31
申请号 JP20000120355 申请日期 2000.04.21
申请人 NIKKO MATERIALS CO LTD 发明人 KURIHARA TOSHIYA;KONAKA MITSUYUKI;NAKAJIMA KOICHI
分类号 C04B35/00;C04B35/495;C23C14/34 主分类号 C04B35/00
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