发明名称 |
ORIGINAL PLATE FOR LITHOGRAPHY |
摘要 |
PROBLEM TO BE SOLVED: To give an original plate for lithography having good on-press developability and a high plate wear resistance and excellent age stability by starting printing by mounting the plate directly in a printer after its exposure. SOLUTION: The original plate for the lithography comprises a heat sensitive layer having microcapsules each containing a compound having a functional group reacting by a heat on a hydrophilic support. In this case, a compound to become the other side of a thermal reaction of the compound having the group is contained in the heat sensitive layer or a layer adjacent to the heat sensitive layer in a state in which the compound is contained in another microcapsule. |
申请公布号 |
JP2001301350(A) |
申请公布日期 |
2001.10.31 |
申请号 |
JP20000119778 |
申请日期 |
2000.04.20 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
YANAKA HIROMITSU;MAEMOTO KAZUO |
分类号 |
G03F7/004;B41N1/14;G03F7/00;G03F7/027;G03F7/11 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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