发明名称 ORIGINAL PLATE FOR LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To give an original plate for lithography having good on-press developability and a high plate wear resistance and excellent age stability by starting printing by mounting the plate directly in a printer after its exposure. SOLUTION: The original plate for the lithography comprises a heat sensitive layer having microcapsules each containing a compound having a functional group reacting by a heat on a hydrophilic support. In this case, a compound to become the other side of a thermal reaction of the compound having the group is contained in the heat sensitive layer or a layer adjacent to the heat sensitive layer in a state in which the compound is contained in another microcapsule.
申请公布号 JP2001301350(A) 申请公布日期 2001.10.31
申请号 JP20000119778 申请日期 2000.04.20
申请人 FUJI PHOTO FILM CO LTD 发明人 YANAKA HIROMITSU;MAEMOTO KAZUO
分类号 G03F7/004;B41N1/14;G03F7/00;G03F7/027;G03F7/11 主分类号 G03F7/004
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