发明名称 MANUFACTURING FACILITY OF SUPPORT FOR LITHOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing facility of a support for a lithographic printing plate capable of being applied to a desmutting treatment using a sulfuric acid of a high temperature and high concentration and a method for manufacturing the same. SOLUTION: The manufacturing facility of the support for the lithographic printing plate comprises at least a desmutting treating means for desmutting treating by contacting a desmutting treating liquid 10 with an aluminum strip 11 in a desmutting treating tank 4, and at least three pass rolls 3a, 3b, 3c provided to elastically spread the strip 11 to introduce and discharge the strip 11 into and from the tank 4 so that the roll 3b disposed at an intermediate part is disposed under the rolls 3a, 3c and near a bottom of the tank 4 and a material of a surface of at least one of the rolls 3a, 3b, 3c is a polyphenylene sulfide resin. The method for manufacturing the support for the lithographic printing plate uses the facility.
申请公布号 JP2001301355(A) 申请公布日期 2001.10.31
申请号 JP20000123805 申请日期 2000.04.25
申请人 FUJI PHOTO FILM CO LTD 发明人 KUBOTA HIROO;SAWADA HIROKAZU;UESUGI AKIO
分类号 G03F7/00;B41N3/03;C23G1/12;C23G1/22;C23G3/02;C25F3/04;(IPC1-7):B41N3/03 主分类号 G03F7/00
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