发明名称 INSPECTION DEVICE AND METHOD FOR SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an inspection device and a method for a semiconductor device capable of exactly specifying a leak location by separately indicating the leak current from the normal current even in the case the leak location is covered with other wiring. SOLUTION: A magnetic field is impressed to a defective semiconductor device 15 as an inspection object by magnetic field generators 18 and 19. Current is sent from a power source 17 to the wiring of the semiconductor device 15. Stress generated in the wiring is detected with a stress detector 21 to produce the first stress image. Then the second stress image for comparison is produced by inspecting a good semiconductor device and a difference image of the first and the second stress images is made with an image processor 25. The difference image is compared with a wiring pattern image of the semiconductor device 15.
申请公布号 JP2001305192(A) 申请公布日期 2001.10.31
申请号 JP20000125471 申请日期 2000.04.26
申请人 NEC CORP 发明人 TAKEDA KUNIHIRO
分类号 G01R31/02;G01M99/00;G01R31/28;G01R31/302;G01R31/303;G01R31/311;G01R31/315;H01L21/66;(IPC1-7):G01R31/28 主分类号 G01R31/02
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