发明名称 INSPECTION METHOD OF SUBSTRATE FOR LIQUID CRYSTAL AND INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an inspection method and device of a liquid crystal substrate by which stain and nonuniformity of an alignment layer, and examination of foreign matter on the alignment layer can be always conducted stable accuracy. SOLUTION: The inspection method of the liquid crystal substrate has a process in which light with a wavelength of 515-565 nm is radiated in a direction perpendicular to the liquid crystal substrate 100 on which alignment layer has been formed and the reflected light of this radiated light is detected to output an image signal responding to the light quantity by a CCD camera 61, and a process in which the light obtained by mixing the light the light with a wavelength of 425-475 nm and the light with a wavelength of 635-685 nm is obliquely radiated to the liquid crystal substrate 100 and the reflected light of this radiated light is detected to output an image signal responding to the light quantity by a CCD camera 71.
申请公布号 JP2001305503(A) 申请公布日期 2001.10.31
申请号 JP20000122604 申请日期 2000.04.24
申请人 SEIKO EPSON CORP 发明人 KITAHARA HIDEKI
分类号 G01N21/956;G01N21/958;G02F1/13;G02F1/1337;(IPC1-7):G02F1/13;G02F1/133 主分类号 G01N21/956
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