Method of forming a micro structure and an X-ray mask

摘要

A method of forming a microstructure having higher aspect ratio by using a general purpose synchrotron orbital radiation apparatus is provided. A resist layer (4) mainly including a copolymer of methylmethacrylate and methacrylic acid is formed on a substrate (2). Lithography by synchrotron orbital radiation is carried out on the resist layer (4), to form a resist pattern. By carrying out normal electroplating, electroforming or the like in accordance with the resist pattern, a microstructure having high aspect ratio is obtained.