发明名称 |
Method of manufacturing enhanced finish sputtering targets |
摘要 |
A method is provided for achieving an enhanced finish on a sputter target surface that results in good film uniformity, low particle counts, and little to no bum-in time. The method involves chemically etching the surface of the sputter target by immersing the surface one or more times in an etching solution, with intermediate rinsing steps. The result is a surface substantially free of mechanical deformation that exhibits a surface similar to a sputtered target with a surface roughness of 10-30 muin.
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申请公布号 |
US6309556(B1) |
申请公布日期 |
2001.10.30 |
申请号 |
US19980146600 |
申请日期 |
1998.09.03 |
申请人 |
PRAXAIR S.T. TECHNOLOGY, INC. |
发明人 |
JOYCE JAMES ELLIOT;HUNT THOMAS JOHN;GILMAN PAUL SANDFORD |
分类号 |
B44C1/22;C23F3/00;(IPC1-7):C23C14/14 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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