| 摘要 |
A denture cleansing composition includes a monoperoxysulfate compound, an effective amount a sequestering agent, such as a citrate compound, for removal of calculus and to provide a pH to the composition in solution (water) of about 3 to 5, and an effective amount of an antimicrobial agent, such as a benzoate compound, to provide antimicrobial activity to the composition to effectively kill bacteria, or other microorganisms found on the dentures. Tests conducted show that the composition is particularly effective in killing microbial strains of Streptococcus mutans, Streptococcus pyogenes, Candida albicans and Actinomyces viscosus within 20 minutes of contact.
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